About the position
PhD student (m/f/d) -
Molecular Beam Epitaxy of AlN-Based Ultrawide-Bandgap Semiconductor Heterostructures
Al-rich (Al,Ga)N and AlN are ultra-wide bandgap (UWBG) semiconductors that have gained significant interest for next-generation RF power and UV light devices. Wurtzite group III-nitride semiconductor heterostructures exhibit strong spontaneous and piezoelectric polarization fields, reaching several MV/cm along the polar c-axis. Consequently, beyond conventional bandgap engineering, polarization engineering provides new opportunities for designing advanced photonic and electronic devices within these heterostructures.
In this project, the successful candidate will focus on designing and growing UWBG polar group III-nitride heterostructures using molecular beam epitaxy (MBE) for novel electronic devices that leverage polarization engineering. Compositionally graded alloy growth will be utilized to enhance doping efficiency and improve ohmic contact formation. Additionally, various growth conditions will be investigated to achieve reliable doping control in binary AlN. Ultimately, Al-rich (Al,Ga)N and AlN-based diodes and field-effect transistors will be grown, fabricated, and characterized.